The Ossila Spin Coater Advanced is a vacuum-free systems ideal for complex spin coating processes.
A small bench footprint and all-in-one chuck means you can start spin coating thin films quickly and easily.
Our innovative chuck holds four different substrate sizes to give you ultimate flexibility in your research.
Implement long spin cycles with high speeds for advanced materials and applications.
Dispense solution while spinning for ultra-thin films.
Or create smooth uniform coatings through static deposition.
Using the Ossila Spin Coater Advanced is the simple and reliable way to make uniform thin films in high precision applications.